Process Gases
| Process Gases | Max Flow (MFC Range) |
|---|
| N2 | 10000 sccm |
| O2 | 5000 sccm |
| Liquid H20 | 10 mL/min |
Temperature Range
| Zone | Min | Max |
|---|
| 1 | 550 C | 1100 C |
|---|
| 2 | 550 C | 1100 C |
|---|
| 3 | 550 C | 1100 C |
|---|
Oxidation Calculator
This calculator uses the Deal–Grove or Massoud models for thermal oxidation of silicon. Choose the oxidation process parameters (wet/dry, oxidation temperature, Si crystal orientation, etc.), and the calculator will return either the oxide thickness given oxidation time or the oxidation time given thickness, with a plot of results.
https://toolbox.nanofab.ualberta.ca/sithox/