Book this tool for wet oxidation processes. For dry oxidation, use Tystar Oxidation (dry). This tube is currently restricted to virgin Si prime wafers, or processed Si/SOI wafers containing silicon oxide or nitride.

Process Gases

Process GasesMax Flow (MFC Range)
N210000 sccm
O25000 sccm
Liquid H2010mL/min

Temperature Range

1550 C1100 C
2550 C1100 C
3550 C1100 C

Oxidation Calculator

This calculator uses the Deal–Grove or Massoud models for thermal oxidation of silicon. Choose the oxidation process parameters (wet/dry, oxidation temperature, Si crystal orientation, etc.), and the calculator will return either the oxide thickness given oxidation time or the oxidation time given thickness, with a plot of results.