Standard Operating Procedures (SOP)

The following is a list of standard operating procedures used in the nanoFAB. Physical copies of these procedures are also available next to each piece of equipment.

Equipment	Process Area	Location
ABM Mask Aligner - Bert - SOP	Lithography	W1-062
ABM Mask Aligner - Grover - SOP	Lithography	W1-062
ABM UV Flood Exposure System - Sunny - SOP	Lithography	W1-062
Alcatel AMS110 ICPRIE SOP	Plasma Etch	W1-062
Allwin AW610 RTA SOP	Ancillary	ECERF W1-062, clean room, dry etch area
Atomic Force Microscope (Dimension Edge) SOP	Characterization	CME L2-112
Autosorb iQ SOP	Characterization	ECERF W1-040
Autosorb Quantachrome 1MP SOP	Characterization	ECERF W1-040
AW610 RTA - Recipe editing procedure	Ancillary
Bob Sputtering System SOP	Deposition	W1-060
Branson Barrel Etcher SOP	Plasma Etch	W1-062
Brewer Spinner and Hotplate SOP	Lithography	W1-062
Bruker XRD D8 Discover SOP	Characterization	CMEB L2-136
Cold Plate (Stir-Kool Sk-12D) SOP	Lithography	Clean room, secondary lithography area
Contact Angle FTA-200 SOP	Characterization	ECERF W1-040
Critical Point Drier SOP	Ancillary	W1-062
Disco DAD 321 Dicing Saw SOP	Packaging	W1-060
Doug Sputter System SOP	Deposition	W1-060
Dragonfly Software Offline Process SOP	Characterization	ECERF Open area (outside W1-28)
Dump Rinse Controller Standard Program	Wet Etch	W1-062
Dymax BlueWave 200 SOP	Lithography	ECERF W1-062
EBL Mark Alignment Procedure	Lithography
Filmetrics F50-UV SOP	Characterization	W1-062
Floyd Sputtering System SOP	Deposition	W1-060
Four-Point Probe (Pro4 4000) SOP	Characterization	ECERF W1-040
Freeze Dryer SOP	Characterization	ECERF w1-040
Gomez E-Beam Evaporation System SOP	Deposition	W1-060
Headway Resist Spinner SOP	Lithography	W1-062
Heidelberg MLA150 SOP	Lithography	Clean room, W1-062B
Hitachi S-4800 FESEM SOP	Characterization	CME building L2-125A
How-To Request a Dicing Blade Change	Packaging	W1-060
How-To Request an Alternative Approved PVD-75 Material	Deposition	W1-060
IBSS Contamination Control System SOP	Characterization	CMEB-L2 121
Interfacial Tension SOP	Characterization	ECERF W1-040
J.A. Woollam VASE Ellipsometer SOP	Characterization	ECERF W1-040
JEOL ARM SOP	Characterization	CME L2-121
KJLC 150LX ALD SOP	Deposition	Cleanroom (W1-062)
KOH and TMAH Etch SOP	Wet Etch	W1-062
memsstar Vapour HF Etcher SOP	Dry Etch	W1-062
Minibrute Furnace SOP	Film Growth, Deposition	W1-062
Nanoscribe Photonic Professional GT SOP	Lithography	W1-062, Primary lithography
Nanoscribe Photonics Professional GT - Standard recipes	Lithography
Orbis PC Micro-XRF SOP	Characterization	ECERF W1-040
Oxford Cobra ICPRIE SOP	Plasma Etch	W1-062
Oxford Estrelas - Chamber Vent Procedure	Plasma Etch	W1-062
Oxford Estrelas ICP-RIE SOP	Plasma Etch	W1-062
Oxford NGP80 RIE SOP	Plasma Etch	W1-062
Parylene Deposition System SOP	Deposition	W1-060
PDMS Process Area SOP	Polymer Processing	W1-060
Perkin Elmer Spectrophotometer SOP	Characterization	W1-040
Photomask Cleaning Station SOP	lithography support	W1-062
PlasmaLab µEtch SOP	Plasma Etch	W1-062
Plasma-Therm Versaline PECVD SOP	Deposition	W1-062
Processing on the Oxford Estrelas	Plasma Etch
Processing on the Oxford NGP80	Plasma Etch
PVA tePla Ion 10Q SOP	Plasma Etch	Cleanroom (W1-062)
PVD-75 Evaporation System SOP	Deposition	W1-060
RAITH150 Two EBL System SOP	Lithography	Clean room, ECERF W1-062A
RCA cleaning SOP	Wet Processing	Cleanroom - wet aisle 1
Renishaw InVia Raman Microscope SOP	Polymer Processing	W1-060
Rigaku XRD SOP	Characterization	ECERF w1-040A
Sitek - Semitool 870-S SRD - SOP	Wet Processing	Aisle 2
Spectrophotometer UV/VIS (Hitachi U-3900H) SOP	Characterization	ECERF w1-040
Sputtering System #4 (Moe) SOP	Deposition	10K
Suss CB6L Bonder SOP	Bonding	W1-062
SUSS MA6/BA6 Mask Aligner - SOP	Lithography	W1-062
Tescan Vega3 SEM SOP	Characterization	ECERF W1-040A
Thin Film Stress Measurement - Flexus 2320 SOP	Characterization	W1-062
TPT HB16 Wire bonder SOP	Packaging	Characterization Lab, ECERF W1-040
Trion PECVD SOP	Deposition	W1-062
Trion RIE SOP	Plasma Etch	W1-062
Tystar LPCVD SOP	Deposition	ECERF W1-062
Tystar Tube 7 (Oxidation) SOP	Deposition	ECERF W1-062
University of Alberta HSE Ladder Safety Guidelines	Deposition	W1-060
UV Ozone Bonder SOP	PDMS	W1-062
Xenon Difluoride (XeF2) Etch System SOP	Dry Etch	W1-062
YES - YES3TA HMDS Oven - SOP	Lithography	W1-062
Zeiss EVO SEM EDX SOP	Characterization	ECERF W1-040A
Zeiss EVO SEM SOP	Characterization	ECERF W1-040
Zeiss Sigma FESEM EBSD SOP	Characterization	ECERF W1-060
Zeiss Sigma FESEM EDX SOP	Characterization	ECERF W1-060
Zeiss Sigma FESEM SOP	Characterization	ECERF W1-060
Zeiss Zeiss Versa Xradia 620 SOP	Characterization	CME L1-113
Zygo Optical Profilometer SOP	Characterization	W1-040

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