Overview

This section describes the Tystar LPCVD tube stack. The stack consists of 6 tubes for Nitride, Poly Si, Doped Poly Si, Doped Anneal, General Anneal and Oxidation. Each tube is considered a separate tool in LMACS.  

LMACS Name

LPCVD Nitride Deposition

LPCVD PolySi Deposition

LPCVD Boron Doped PolySi Deposition

Tystar Doped Anneal

Tystar General Anneal

Tystar Oxidation

Process Area

Deposition

ModelTytan Mini Series
VendorTystar
Team

Timothy Harrison  Glenn Elaschuk Aaron Hryciw 

LPCVD Tube Configuration & Chemistry

The LPCVD Stack contains 3 furnaces, each configured for unique processing, with different chemistry. Details of the configuration are listed below. 


Tube NumberProcess NameChemistry
1EMPTYN/A
2NitrideDCS, NH3
3Poly Si(100%) SiH4
4Boron Doped Poly Si(100%) SiH4, (3%) BCl3 
5Doped Anneal

N2

6General AnnealN2
7OxidationOxygen, H2O
8EMPTYN/A

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