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The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies, or parts using fluorine- and oxygen-based chemistries. The system has a compact, modular design built on a space-saving platform. |
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Contacts
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Key Documents
| SOP | Trion RIE SOP |
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| Hazard Assessment | Trion RIE Hazard Assessment - HA |
| Process Information | Trion RIE etch information |
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Staff Documents
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Related Documents
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