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Overview

The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies, or parts using fluorine- and oxygen-based chemistries. The system has a compact, modular design built on a space-saving platform.

LMACS NameRIE (Trion)
Process Area

Plasma Etch

ModelPhantom RIE
VendorTrion
Team



System Features

Wafer Handlingpieces (mounted)100 mm150 mm
Gas SpeciesCHF3SF6CF4O2
RF Power600 W


EtchingSiO2SiN

Key Documents