Overview

The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies, or parts using fluorine- and oxygen-based chemistries. The system has a compact, modular design built on a space-saving platform.

LMACS NameRIE (Trion)
Process Area

Plasma Etch

ModelPhantom RIE
VendorTrion
Team

Aaron Hryciw Scott Munro Devin Fortier



System Features

Wafer Handlingpieces (mounted)100 mm150 mm
Gas SpeciesCHF3SF6CF4O2
RF Power600 W


EtchingSiO2SiN

Key Documents

SOPTrion RIE SOP
Hazard AssessmentTrion RIE Hazard Assessment - HA
Process InformationTrion RIE etch information

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