Plasma-Therm’s VERSALINE PECVD is the result of decades of technological innovation. VERSALINE PECVD systems can deposit many different high-quality films, delivering maximum productivity with low total cost of ownership. A wide variety of dielectric films can be deposited by parallel-plate plasma deposition systems. Film thickness, composition and stress control, as well as excellent uniformity are easily managed through a wide range of process chemistries and parameters. The parallel plate configuration of VERSALINE PECVD is designed to provide a clean processing environment and require little maintenance. |