This section describes the Tystar LPCVD tube stack. The stack consists of 6 tubes for Nitride, Poly Si, Doped Poly Si, Doped Anneal, General Anneal and Oxidation. Each tube is considered a separate tool in LMACS.  




LMACS Name

LPCVD Nitride Deposition

LPCVD PolySi Deposition

LPCVD Boron Doped PolySi Deposition

Tystar Doped Anneal

Tystar General Anneal

Tystar Oxidation

Process Area

ModelTytan Mini Series
VendorTystar
Team

Timothy Harrison  Glenn Elaschuk Aaron Hryciw 




Serial NumberLPCVD 4201061LS, Tystar Atmospheric 4201062LS
UofA Asset Tag NumberLPCVD 451707,  Tystar Atmospheric 454969
Service Contract

  - Phone / Email support until  

Outstanding Service Visit

Has Been Completed  

Purchased  

Requires 2 week lead time prior to booking

Gas Safety Monitor GSM-1A




Contacts


NameCompanyEmailPhone
Technical ContactHenry HeidbrederTystar Corporationhenryh@tystar.com310-618-4019

Jim SmithTystar Corporationjsmith@tystar.com310-618-4019
Sales Contact

Long Hoang

Tystar Corporationlong@tystar.com

310-781-9219 x223

Quartzware (sales)Trinh NguyenLP Glassblowing Incsales@lpglassblowing.com1-408-988-7561
Quartzware (Technical)RudyLP Glassblowing Inc



LPCVD Tube Configuration & Chemistry

The LPCVD Stack contains 3 furnaces, each configured for unique processing, with different chemistry. Details of the configuration are listed below. 


Tube NumberProcess NameChemistry
1EMPTYN/A
2NitrideDCS, NH3
3Poly Si(100%) SiH4
4Boron Doped Poly Si(100%) SiH4, (3%) BCl3 
5Doped Anneal

N2

6General AnnealN2
7OxidationOxygen, H2O
8EMPTYN/A


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