Equipment

Litho Wet Deck #1 - TMAH

Litho Wet Deck #2 - TMAH

Process AreaPhotoresist development - TMAH based developers
LocationECERF W1-062, Lithography
Assessed ByGustavo de Oliveira
Date of Assessment

 

Final Assessment

  

Please Review

Carefully review and familiarize yourself with the hazard assessment applicable to your tool or process.