| Product | PA 400 R |
|---|---|
| Manufacturer | HD MicroSystems |
| Composition | 60–100% 1-methoxy-2-propyl acetate; liquid |
| Synonyms | PGMEA |
| Typical Uses | Rinse/develop stop for HD 4100 photodefinable polyimide |
| Hazards |
Flammable liquids Category 3
;
Acute toxicity Category 4
(dermal) |
| Storage | Cabinet 6 (flammables cabinet in Wet Aisle 1) |
| Disposal | Solid: Organic waste / organic sharps waste containers in primary or secondary litho areas. Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A. |
| Comments | Developing must occur within Aisle 1 fumehood. A puddle develop process may be done using the Laurell spinner, lid open (interlock defeated using a magnetic stir rod), with a foil chimney surrounding the chuck, such that all developer is caught in the chimney and flows into the spinner waste. Pour a working volume of PA 400 R into a small beaker to use during puddle develop process. |
| Status |
Check First
Please contact a nanoFAB staff member for uses not listed above.
Additional information
- Related SDSs:
- HD 4100 process guide