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idsds


ProductDeveloper AR 600-549
ManufacturerAllresist GmbH
Composition≥90% diethyl malonate, <10% anisole; liquid
Synonyms
Typical UsesElectron-beam lithography resist developer
Hazards

Nfpa704
HealthNum1
FlamNum2
Whmis picts
Excltrue

Hazcat
HazClassSerious eye damage/eye irritation
HazCat2

StorageCabinet 6 (flammables cabinet in Wet Aisle 2)
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsTo be used in litho wet decks only, for room-temperature development.  Do not heat.
Status




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groupnf-staff


Import Request

Trong Ngo, Barclay group,  . [Request]





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Please contact a nanoFAB staff member for uses not listed above.


Embedded Google Drive File
urlhttps://drive.google.com/file/d/13alfh2iO3qTyinWJd9AXg_awac6Jb2zK/view?usp=drivesdk
fullwidthtrue
height600