| Product | Developer AR 600-549 |
|---|---|
| Manufacturer | Allresist GmbH |
| Composition | ≥90% diethyl malonate, <10% anisole; liquid |
| Synonyms | |
| Typical Uses | Electron-beam lithography resist developer |
| Hazards |
Serious eye damage/eye irritation Category 2
|
| Storage | Cabinet 6 (flammables cabinet in Wet Aisle 2) |
| Disposal | Solid: Organic waste / organic sharps waste containers in primary or secondary litho areas. Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A. |
| Comments | To be used in litho wet decks only, for room-temperature development. Do not heat. |
| Status |
Check First
Please contact a nanoFAB staff member for uses not listed above.