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ProductDeveloper AR 600-549
ManufacturerAllresist GmbH
Composition≥90% diethyl malonate, <10% anisole; liquid
Typical UsesElectron-beam lithography resist developer

1 0 2 Less serious health effects

Serious eye damage/eye irritation Category 2

StorageCabinet 6 (flammables cabinet in Wet Aisle 2)
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsTo be used in litho wet decks only, for room-temperature development.  Do not heat.

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Please contact a nanoFAB staff member for uses not listed above.