| Product | SU-8 2000 Series Resists |
|---|---|
| Manufacturer | MicroChem Corporation |
| Composition | 23–96% cyclopentanone, 0.3–5% mixed triarylsulfonium/hexafluoroantimonate salt, 0.3–5% propylene carbonate, 3–75% epoxy resin; liquid |
| Synonyms | SU-8 |
| Typical Uses | Photolithography |
| Hazards | 
 Skin sensitizer Category 1;
Skin corrosion/irritation Category 2
;
Germ cell mutagenicity Category 2
; Acute hazards aquatic environment Category 2;
Serious eye damage/eye irritation Category 2A
;
Specific target organ toxicity – single exposure Category 3
;
Flammable liquids Category 3
; Acute toxicity (oral) Category 4; Acute toxicity (inhalation) Category 4 |
| Storage | Cabinet 11 (flammables cabinet in Wet Aisle 1) |
| Disposal | Solid: Organic waste / organic sharps waste containers in primary or secondary litho areas. Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A. |
| Comments | Negative-tone, epoxy-based photoresist. N.B. The nanoFAB only stocks SU-8 2050 for communal use; other dilutions may be brought in by users for their own use. |
| Status | STOCKED |
Check First
Please contact a nanoFAB staff member for uses not listed above.