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ProductAZ 9260 photoresist
Manufacturer

EMD Performance Materials Corp.

Composition55–60% 1-Methoxy-2-propanol acetate, ≤5% Diazonaphthoquinonesulfonic ester, <0.3% 2-Methoxy-1-propanol acetate, 35–40% Cresol novolak resin; liquid
Synonyms
Typical UsesPhotoresist for thick film applications
Hazards

Nfpa704
HealthNum2
FlamNum2
 
Whmis picts
Flamtrue
Excltrue

Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2
,
Hazcat
HazClassFlammable liquids
HazCat3
,
Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottle in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
Comments
Status




Show If
groupnf-staff


Import Request

Ali Banss, Sheba Microsystems, . [Request]





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titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


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