ProductChrome Mask Etchant 9030
ManufacturerTransene Company, Inc.
Composition4–6% perchloric acid, 6–8% ceric ammonium nitrate, 86–90% water; liquid
Synonymschrome etch
Typical UsesWet-etching of chromium thin films (including on photomasks)
Hazards

, , , , , (oral),  (dermal),  (inhalation)   

Storage

Cabinet 9 (acids cabinet in Wet Aisle 1)

DisposalCollect in "Chrome etch waste" bottle in Cabinet 9 and dispose of as hazardous material when full.
Comments
Status

  




Please contact a nanoFAB staff member for uses not listed above.