ProductMicroposit MF-319 Developer
ManufacturerRohm And Haas Electronic Materials LLC
Composition95.0–99.0% water, 1.0–5.0% tetramethylammonium hydroxide, <1.0% polyalkylene glycol; liquid
Synonyms319, MF-319
Typical UsesDeveloper for photolithography
Hazards

,  (oral), (dermal), , 

StorageCabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks
DisposalPour into wet deck (Developer Station #1/#2, Wet Deck 1A/1B/2A) and rinse copiously with DI water.
CommentsStandard developer for LOR 5B in lift-off bilayer process.  Contains 2.45% TMAH; normality of 0.237 N.  Login to tool Developer Station #1 - TMAH or Developer Station #2 - TMAH when using.  Wear PPE when handling:  chemical-resistant gloves, acid apron, face shield.
Status

  




Please contact a nanoFAB staff member for uses not listed above.