ProductAZ 5214E photoresist
Manufacturer

EMD Performance Materials Corp.

Composition70–75% 1-methoxy-2-propanol acetate, 1–5% diazonaphthoquinonesulfonic ester, <0.3% 2-methoxy-1-propanol acetate, 20–25% cresol novolak resin, <2% Phenolic compound; liquid
Synonyms
Typical UsesImage-reversal photoresist for broadband and g/h/i-line exposure
Hazards

 

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StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
Comments
Status

  




Please contact a nanoFAB staff member for uses not listed above.