ProductAZ 15nXT (450 CPS) photoresist
Manufacturer

Merck KGaA

Composition1–3% 1,8-naphthalimidyl triflate, 0.1–0.3% 2-methoxy-1-propanol acetate, 50–100% 1-methoxy-2-propanol acetate; liquid (only hazardous components listed)
SynonymsAZ 15nXT
Typical UsesThick negative photoresist optimised for plating
Hazards

 

, (central nervous system)

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottle in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
Comments
Status





Import Request

Ali Banss, Sheba Microsystems, . [Request]





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