ProductAZ 12XT-20PL-10 photoresist
Manufacturer

EMD Performance Materials Corp.

Composition55–60% 1-methoxy-2-propanol acetate, 20–25% non-hazardous styrene-acrylate polymer, <0.3% 2-methoxy-1-propanol acetate, 15–20% cresol novolak resin; liquid
SynonymsAZ 12XT
Typical UsesChemically amplified thick positive photoresist
Hazards

 

, (central nervous system)

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottle in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
Comments
Status





Import Request

Ali Banss, Sheba Microsystems, . [Request]





Please contact a nanoFAB staff member for uses not listed above.


Additional SDS Sheets