ProductAZ 300 MIF Developer
ManufacturerEMD Performance Materials Corp
Composition>95% water, <3% tetramethylammonium hydroxide; liquid
Typical UsesDeveloper for photolithography

, (oral)

StorageCabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks
DisposalPour into wet deck (Litho Wet Deck 1/2, Wet Deck 1A/1B/2A) and rinse copiously with DI water.
CommentsLogin to tool Litho Wet Deck #1 - TMAH or Litho Wet Deck #2 - TMAH when using.  Wear PPE when handling:  chemical-resistant gloves, acid apron, face shield.

Import Request

Ali Banss, Sheba Microsystems, . [Request]

Please contact a nanoFAB staff member for uses not listed above.