ProductAZ 1529 photoresist
Manufacturer

EMD Performance Materials Corp.

Composition65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, 0 - 0.3% 2-Methoxy-1-propanol acetate, 25–30% Cresol novolak resin; liquid
Synonyms
Typical UsesPositive-tone photoresist for broadband and g/h/i-line exposure
Hazards

 

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsStandard recipe yields ~3.4 µm resist thickness.
Status

  




Please contact a nanoFAB staff member for uses not listed above.