Used for photoresist developing. With additional training, development of HSQ resist using 25% TMAH on Litho Wet Deck #1. Due to the additional hazard of using this developer, a Buddy is required for after-hours access.




LMACS NameLitho Wet Deck #1Litho Wet Deck #1 - TMAH
Confluence Labellitho-wet-deck-1
Process Area

ModelInsert the Equipment model 
VendorInsert the Equipment vendor
Team





Serial NumberInsert the equipment serial number
UofA Asset Tag NumberInsert the equipment UofA Asset tag number
Service Contract




Contacts


NameCompanyEmailPhone
Technical ContactInsert the technical contact


Sales ContactInsert the sales contact




System Features

Wafer HandlingPieces100 mm150 mm
UtilitiesN2DI H2O
Chemicals AllowedIPA/AcetoneDevelopersTMAH


Key Documents

Insert links to Google Drive documents OR links to confluence pages that contain the docs

Standard Operating Procedures




Staff Documents

Dump Rinse Controller

Operator Manual
Installation Guide
System Drawings

Drive Folder


Related Documents