ProductAZ P4330-RS photoresist
Manufacturer

EMD Performance Materials Corp.

Composition65–70% 1-methoxy-2-propanol acetate, 1–5% diazonaphthoquinonesulfonic ester, <0.3% 2-methoxy-1-propanol acetate, 25–30% cresol novolak resin; liquid
Synonyms
Typical UsesPhotoresist for thick film applications
Hazards

 

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StorageWorking volumes in amber bottles, stored in primary litho area; stock bottle in Cabinet 14 (flammables fridge)
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsHandle and process as AZ P4620.
Status





Import Request

Danny Pulikkaseril, Micralyne, . [Request]

Last reviewed

 





Please contact a nanoFAB staff member for uses not listed above.