ProductAZ 1529 Photoresist
Manufacturer

EMD Performance Materials Corp.

Composition65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, 0 - 0.3% 2-Methoxy-1-propanol acetate25–30% Cresol novolak resin
Synonyms
Typical UsesPositive-tone photoresist for broadband and g/h/i-line exposure
Hazards

 

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge.
DisposalLiquid:  solvent waste bottles in wet decks; solid: organics waste pail under Aisle 1 Fumehood
CommentsStandard recipe yields ~3.4 µm resist thickness.
Status

  




Please contact a nanoFAB staff member for uses not listed above.