Product
AZ 1529 Photoresist
Manufacturer
EMD Performance Materials Corp.
Composition
65–70%
1-Methoxy-2-propanol acetate
, 5–10%
Diazonaphthoquinonesulfonic ester
, <0.3%
2-Methoxy-1-propanol acetate
,
25–30%
Cresol novolak resin
Synonyms
Typical Uses
Positive-tone photoresist for broadband and g/h/i-line exposure
Hazards
Storage
Working volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge.
Disposal
Liquid: solvent waste bottles in wet decks; solid: organics waste pail under Aisle 1 Fumehood
Comments
Standard recipe yields ~3.4 µm resist thickness.
Status
Please contact a nanoFAB staff member for uses not listed above.