The nanoFAB operates a Heidelberg DWL-200 to fabricate 5" × 5" and 7" × 7" photomasks suitable for pattern transfer using contact photolithography techniques. We offer photomask fabrication as a service only, users cannot be trained to operate the pattern generator. Photomasks will be fabricated and shipped according to the policies below. |
Photomasks are available in two sizes, each coated with approximately 100 nm thick chrome:
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