Material | Composition | Product | Synonyms | Status |
---|---|---|---|---|
2D_CL_PC polymer solution | 94% chloroform, 6 % polycarbonate; liquid | 2D_CL_PC polymer solution | RESTRICTED USE | |
3DMAS - Tris(dimethylamino)silane | 99.999%-Si | Tris(dimethylamino)silane | 3DMAS | STOCKED RESTRICTED USE |
A-174 silane | 70–100% 3-trimethoxysilylpropyl methacrylate, 0.1–1% 4-methoxy-phenol; liquid | A-174 silane | gamma-methacryloxypropyltrimethoxysilane, gamma-MAPS, 3-(trimethoxysilyl)propyl methacrylate | STOCKED |
Acetone | 100% acetone; liquid | Acetone | 2-propanone, propanone, dimethyl ketone | STOCKED |
Air Zero (zero air) | 100% Air | Air Zero | Air, Medipure Air, Plasma Air, Zero Air, Air - Diving Grade | STOCKED |
Alumina | 100% alumina; solid | Alumina | Al2O3, aluminum oxide, emery, corundum | STOCKED |
Aluminum | 100% aluminum; solid | Aluminum | Al, aluminium | STOCKED |
Aluminum etch | Nitric acid, Phosphoric acid, Acetic acid, Water | Aluminum Etchant Type A | STOCKED | |
Ammonia | 99.5 - 100% ammonia; gas | Ammonia | NH3 |
|
Ammonium hydroxide | 70–75% water, 25–30% ammonium hydroxide; liquid | Ammonium hydroxide | ammonia solution, ammonia water, ammonium hydrate | |
Anisole | 100% anisole; liquid | Anisole | methoxybenzene, methyl phenyl ether, ZEP-A | STOCKED |
Antimony | 100% antimony; solid | Antimony | Sb, antimonide, stibium, stibium metallicum | STOCKED RESTRICTED USE |
Antimony trisulfide precursor solution | 35.9 wt.% carbon disulfide, 30.3 wt.% ethanol, 28.1 wt.% n-butylamine, 5.7% antimony trioxide; liquid | Antimony trisulfide precursor solution | RESTRICTED USE | |
APC-AR alloy | ≤100% silver, other components not disclosed; solid | APC-AR alloy (sputtering target) | ||
APC-TR alloy | ≤100% silver, other components not disclosed; solid | APC-TR alloy (sputtering target) | ||
AQM SiOx | 100% hydrogen silsesquioxane based polymer; solid | AQM SiOx | HSQ | STOCKED |
aquaSAVE | 1–6% poly(aniline sulfonic acid), 6–11% isopropyl alcohol, 88–93% water; liquid | aquaSAVE-53za | aquaSAVE | |
Argon | 99.5% - 100% Argon | Argon Ar | Shielding gas, Argon 40, Extendapak Argon | STOCKED |
AVA-GD7398 | 100% organometallic compound (trade secret); solid (powder) | UDS-OLED Organometallic Compound (AVA-GD7398) | N/A | |
AVA-RD7999 | 100% organometallic compound (trade secret); solid (powder) | UDS-OLED Organometallic Compound (AVA-RD7999) | N/A | |
AZ 12XT-20PL-10 photoresist | 55–60% 1-methoxy-2-propanol acetate, 20–25% non-hazardous styrene-acrylate polymer, <0.3% 2-methoxy-1-propanol acetate, 15–20% cresol novolak resin; liquid | AZ 12XT-20PL-10 photoresist | AZ 12XT | |
AZ 15nXT (450 CPS) photoresist | 1–3% 1,8-naphthalimidyl triflate, 0.1–0.3% 2-methoxy-1-propanol acetate, 50–100% 1-methoxy-2-propanol acetate; liquid (only hazardous components listed) | AZ 15nXT (450 CPS) photoresist | AZ 15nXT | |
AZ 300 MIF Developer | >95% water, <3% tetramethylammonium hydroxide; liquid | AZ 300 MIF Developer | ||
AZ 400K 1:4 Developer | >95% water, <2% potassium borates; liquid | AZ 400K Developer Diluted 1:4 | AZ 400K | STOCKED |
AZ 726 MIF Developer | >95% water, 1–2.5% tetramethylammonium hydroxide; liquid | AZ 726 MIF Developer | ||
AZ 1505 photoresist | 70–80% 1-methoxy-2-propanol acetate, 5–10% diazonaphthoquinonesulfonic ester, <0.3% 2-methoxy-1-propanol acetate, 15–20% cresol novolak resin; liquid | AZ 1505 photoresist | ||
AZ 1512 photoresist | 75–100% 1-methoxy-2-propanol acetate, 5% diazonaphthoquinonesulfonic ester, 19% cresol novolak resin; liquid | AZ 1512 photoresist | STOCKED | |
AZ 1529 photoresist | 65–70% 1-methoxy-2-propanol acetate, 5–10% diazonaphthoquinonesulfonic ester, 0 - 0.3% 2-methoxy-1-propanol acetate, 25–30% cresol novolak resin; liquid | AZ 1529 photoresist | STOCKED | |
AZ 5214E photoresist | 70–75% 1-methoxy-2-propanol acetate, 1–5% diazonaphthoquinonesulfonic ester, <0.3% 2-methoxy-1-propanol acetate, 20–25% cresol novolak resin, <2% Phenolic compound; liquid | AZ 5214E photoresist | STOCKED | |
AZ 9260 photoresist | 55–60% 1-methoxy-2-propanol acetate, ≤5% diazonaphthoquinonesulfonic ester, <0.3% 2-methoxy-1-propanol acetate, 35–40% cresol novolak resin; liquid | AZ 9260 photoresist |
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