| Product | AZ 300 MIF Developer |
|---|---|
| Manufacturer | EMD Performance Materials Corp |
| Composition | >95% water, <3% tetramethylammonium hydroxide; liquid |
| Synonyms | |
| Typical Uses | Developer for photolithography |
| Hazards | 
Corrosive to metals Category 1
,
Skin corrosion/irritation Category 2
,
Serious eye damage/eye irritation Category 2A
,
Acute toxicity Category 4
(oral) |
| Storage | Cabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks |
| Disposal | Pour into wet deck (Litho Wet Deck 1/2, Wet Deck 1A/1B/2A) and rinse copiously with DI water. |
| Comments | Login to tool Litho Wet Deck #1 - TMAH or Litho Wet Deck #2 - TMAH when using. Wear PPE when handling: chemical-resistant gloves, acid apron, face shield. |
| Status |
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Please contact a nanoFAB staff member for uses not listed above.