Overview

Used for photoresist developing. With additional training, development of HSQ resist using 25% TMAH on Litho Wet Deck #1. Due to the additional hazard of using this developer, a Buddy is required for after-hours access.

LMACS NameLitho Wet Deck #1, Litho Wet Deck #1 - TMAH
Confluence Labellitho-wet-deck-1
Process Area

Lithography

Model
Vendor
Team

 Gustavo de Oliveira Luiz  Aaron HryciwAdam Pettigrew



System Features

Wafer HandlingPieces100 mm150 mm
UtilitiesN2DI H2O
Chemicals AllowedIPA/AcetoneDevelopersTMAH

Key Documents

Standard Operating Procedures


Related Documents