Overview

Wet Deck 2A is used for general H2O and organic wet processing including soaking and ultrasonic bath. The is also a KOH bath available for users . With additional training, use of TMAH is permitted. Due to the additional hazard of using this chemical, a Buddy is required for after-hours access.

System Features

Wafer HandlingPieces100 mm150 mm
Gas SpeciesN2

Water SupplyCityDI
Acceptable ChemicalsAcetone/IPAKOHTMAH

Key Documents

KOH and TMAH Etch SOPKOH and TMAH Etch SOP

KOH Etching of Bulk Silicon

KOH Etching of Bulk Silicon