Overview

Ultra-high-resolution, low-voltage (0.1–30 kV), electron-beam lithography tool, capable of writing structures over a 150 mm diameter wafer. Demonstrated proficiency on an SEM is a prerequisite to receiving training on this tool.

ATTENTION

Business hours bookings must fall within one of these 3 time windows:

  • 8 am to 11 am
  • 11 am to 2 pm
  • 2 pm to 5 pm

Any violation of this will result in booking cancellation.

LMACS NameRAITH150 Two EBL System
Confluence Labelraith-150ii-ebl
Process Area

Lithography

Model150 Two
VendorRAITH
Team

Aaron Hryciw Gustavo de Oliveira Luiz

Location

CME L1-113

System Features

Acceleration Voltage0.1 kV to 30 kV
Minimum ResolutionField emission source with ultimate resolution <10 nm
Sample Sizespieces to 100 mm
Field StitchingBetter than 25 nm
Overlay AlignmentBetter than 40 nm
StageFixed Beam Moving Stage (FBMS) capable
BeamBeam tracking capable for increased e-beam stability
EnvironmentalEnvironmental controlled enclosure

Documents

Operating Procedures & Hazard Assessments

RAITH150 Two SOP & HA Listing

Related Documents