| Product | Microposit MF-319 Developer |
|---|---|
| Manufacturer | Rohm And Haas Electronic Materials LLC |
| Composition | 95.0–99.0% water, 1.0–5.0% tetramethylammonium hydroxide, <1.0% polyalkylene glycol; liquid |
| Synonyms | 319, MF-319 |
| Typical Uses | Developer for photolithography |
| Hazards | 
Corrosive to metals Category 1
,
Specific target organ toxicity – single exposure Category 1
(oral),
Specific target organ toxicity – repeated exposure Category 1
(dermal),
Skin corrosion/irritation Category 2
,
Serious eye damage/eye irritation Category 2A
|
| Storage | Developer cabinet in wet aisle 1; underneath litho wet decks |
| Disposal | Pour into wet deck (Litho Wet Deck 1/2, Wet Deck 1A/1B/2A) and rinse copiously with DI water. |
| Comments | Standard developer for LOR 5B in lift-off bilayer process. Contains 2.45% TMAH; normality of 0.237 N. |
| Status | STOCKED |
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Please contact a nanoFAB staff member for uses not listed above.