The following is a list of standard recipes, techniques, tips and other various application notes that have been developed in the nanoFAB over time. The information here may serve as a useful starting point for further process development.
Title | Applicable Equipment | Process Area |
---|---|---|
Aluminum Etching | Wet Deck | Wet-Etch |
AZ 1512 & 1529 photoresist baseline recipes | Spinner, hotplate, mask aligner, maskless aligner | Photolithography |
AZ 5214E photoresist baseline recipe | Spinner, hotplate, mask aligner, maskless aligner | Photolithography |
AZ P4620 photoresist baseline recipe | Spinner, hotplate, mask aligner, maskless aligner | Photolithography |
CasaXPS Library Files for Kratos Ultra and PHI VPIII | Kratos Ultra XPS and PHI VPIII | |
Chrome Etching | Wet Deck | Wet-Etch |
Gold Etching | Wet Deck | wet-etch |
HF etching | Wet Process - HF/BOE - Wet Deck 1A / 1B | wet etch |
KOH Etching of Bulk Silicon | KOH Etch Bath | Etch |
LOR 5B / AZ 1512 Bilayer Procedure | HMDS oven, spinner, hotplate, mask aligner, direct-write lithography system, litho wet deck | Lithography |
LOR 5B / HPR 504 Bilayer Recipe | HMDS Oven, Spinner, hotplate | Lithography |
Nitric Acid Etching and Disposal | Wet Deck | Wet-Etch |
Parylene adhesion promotion | Parylene deposition system (PDS 2010 Labcoater) | Deposition |
PDMS Micromolding | ICPRIE, PDMS Station | PDMS |
PDMS Residue Removal Process using TBAF | PDMS | |
Piranha Cleaning | Wet Deck | wet-etch, cleaning |
PMMA EBL Lift Off Procedure | RAITH150 Two | EBL, Lithography |
PVD film thickness measurements using standard witness chips | PVD tools (sputtering, e-beam evaporation), general use wet deck, Alpha-Step IQ | Deposition, characterization |
Spin-on polyimide SOP (non-photodefinable) | Aisle 1 fumehood, Headway spinner, vacuum oven | spin-coating |
SU-8 Negative Photoresist | Head-way spinner, hotplate, mask aligner | lithography |
SUSS MABA6 Chuck Diagrams | SUSS MABA6 | Lithography |
Temporary wafer bonding using Crystalbond | spinner, hotplate, plasma etch systems | bonding, etch |
ZEP Exposure & Development Results | RAITH 150-II, Cold Plate | EBL, Lithography |
ZEP Spin Curves | Headway Resist Spinner | lithography |