| Product | AZ 1529 Photoresist |
|---|---|
| Manufacturer | EMD Performance Materials Corp. |
| Composition | 65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, 0-0.3% 2-Methoxy-1-propanol acetate, 25–30% Cresol novolak resin |
| Synonyms | |
| Typical Uses | Positive-tone photoresist for broadband and g/h/i-line exposure |
| Hazards |
Serious eye damage/eye irritation Category 2A
Flammable liquids Category 3
Specific target organ toxicity – single exposure Category 3
|
| Storage | Working volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge. |
| Disposal | Liquid: solvent waste bottles in wet decks; solid: organics waste pail under Aisle 1 Fumehood |
| Comments | Standard recipe yields ~3.4 µm resist thickness. |
| Status | STOCKED |
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Please contact a nanoFAB staff member for uses not listed above.