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ProductAZ 1529 Photoresist
Manufacturer

EMD Performance Materials Corp.

Composition65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, <0.3% 2-Methoxy-1-propanol acetate25–30% Cresol novolak resin
Synonyms
Typical UsesPositive-tone photoresist for broadband and g/h/i-line exposure
Hazards

2 0 2   Flammable Less serious health effects

Serious eye damage/eye irritation Category 2A

Flammable liquids Category 3

Specific target organ toxicity – single exposure Category 3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge.
DisposalLiquid:  solvent waste bottles in wet decks; solid: organics waste pail under Aisle 1 Fumehood
CommentsStandard recipe yields ~3.4 µm resist thickness.
Status

STOCKED  

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Please contact a nanoFAB staff member for uses not listed above.

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