GDSII is the standard file format for lithography designs. One of the first steps in your fabrication process is often the creation of a GDSII pattern file, whether to print on a photomask, or to expose directly on your substrate via electron-beam lithography or direct-write laser lithography. In some cases, you may have a photomask design already provided to you by a colleague; in others, however, you may need to construct the design yourself. To this end, the nanoFAB supports two GDSII layout software options: a graphical CAD tool (KLayout) and a script-based approach (Raith_GDSII MATLAB toolbox).
Please note that the nanoFAB does not offer any design verification services.