The nanoFAB operates a Heidelberg DWL-200 to fabricate 5" × 5" and 7" × 7" photomasks suitable for pattern transfer using contact photolithography techniques. We offer photomask fabrication as a service only, users cannot be trained to operate the pattern generator. Photomasks will be fabricated and shipped according to the policies below.
Please note that this service is only available to Canadian users.
Photomasks are available in two sizes, each coated with approximately 100 nm thick Chrome:
- 5” × 5” × 0.090” soda-lime glass
- 7” × 7” × 0.090” soda-lime glass
- All photomask fabrication requests must be submitted via LMACS.
- Multi-layer submissions must use the same GDSII file.
- Each layer represents one physical mask.
- Due to inherent differences in various CAD program outputs, mask results may vary.
- The minimum feature size is 1 µm (exposed with the 4 mm lens); however, features below 2 µm may show distortions or fail to render.
- Turnaround times may vary due to staff resources and equipment availability; however, the turnaround time under normal circumstances is approximately 10 business days.
- Software support is provided on-site using the current version of L-Edit available in the nanoFAB design environment.
- The nanoFAB is not responsible for the integrity or compatibility of designs produced off-site, or with other versions of L-Edit.
- Only the GDSII file format is accepted.
- Submitted GDSII files will be stored for 1 year from the date of submission. After this period design files will be discarded
- Masks with Problem status will be held in the queue for a maximum of 5 days, after which they will be deleted.
- Any warnings generated will be treated as a problem.
- If there is a problem with one layer of a multi-layer mask set, all layers must be resubmitted.
- All status updates are sent automatically via email. It is the user’s responsibility to ensure that the nanoFAB has the correct email address on file.
- Users can manage their contact info via their LMACS profile page.