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ProductSU-8 2000 Series Resists
ManufacturerMicroChem Corporation 
Composition23–96% cyclopentanone, 0.3–5% mixed triarylsulfonium/hexafluoroantimonate salt, 0.3–5% propylene carbonate, 3–75% epoxy resin; liquid
SynonymsSU-8
Typical UsesPhotolithography
Hazards

Nfpa704
HealthNum2
FlamNum3

Whmis picts
Flamtrue
Envtrue
Excltrue

Skin sensitizer 

Hazcat
HazClass[none]
HazCat1
; 
Hazcat
HazClassSkin corrosion/irritation
HazCat2
; 
Hazcat
HazClassGerm cell mutagenicity
HazCat2
;  Acute hazards aquatic environment 
Hazcat
HazClass[none]
HazCat2
; 
Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2
; 
Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat3
; 
Hazcat
HazClassFlammable liquids
HazCat3
; Acute toxicity (oral) 
Hazcat
HazClass[none]
HazCat4
; Acute toxicity (inhalation) 
Hazcat
HazClass[none]
HazCat4

Storage

Cabinet 11 (flammables cabinet in Wet Aisle 1)

DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
Comments

Negative-tone, epoxy-based photoresist. 

N.B.  The nanoFAB only stocks SU-8 2050 for communal use; other dilutions may be brought in by users for their own use.

Status

Status
titleStocked
  




Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


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