Please note due to Covid-19 restrictions, access to some nanoFAB resources may not be available.

Versions Compared

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.


Page properties
idsds


ProductMicroposit MF-319 Developer
ManufacturerRohm And Haas Electronic Materials LLC
Composition95.0–99.0% water, 1.0–5.0% tetramethylammonium hydroxide, <1.0% polyalkylene glycol; liquid
Synonyms319, MF-319
Typical UsesDeveloper for photolithography
Hazards

Nfpa704
HealthNum3

Whmis picts
Healthtrue
Corrtrue

Hazcat
HazClassCorrosive to metals
HazCat1
Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat1
 (oral), 
Hazcat
HazClassSpecific target organ toxicity – repeated exposure
HazCat1
(dermal), 
Hazcat
HazClassSkin corrosion/irritation
HazCat2
Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2

StorageCabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks
DisposalPour into wet deck (Litho Wet Deck 1/2, Wet Deck 1A/1B/2A) and rinse copiously with DI water.
CommentsStandard developer for LOR 5B in lift-off bilayer processContains 2Contains 2.45% TMAH; normality of 0of 0.237 N.  Login to tool Litho Wet Deck #1 - TMAH or Litho Wet Deck #2 - TMAH when using.  Wear PPE when handling:  chemical-resistant gloves, acid apron, face shield.
Status

Status
titleStocked
  




Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


Embedded Google Drive File
urlhttps://drive.google.com/open?id=0B5USr1fI1bMeaVI2QVFoMElJQ0E
height600