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ProductAZ 5214E photoresist
Manufacturer

EMD Performance Materials Corp.

Composition70–75% 1-Methoxy-2-propanol acetate, 1–5% Diazonaphthoquinonesulfonic ester, <0.3% 2-Methoxy-1-propanol acetate, 20–25% Cresol novolak resin, <2% Phenolic compound; liquid
Synonyms
Typical UsesImage-reversal photoresist for broadband and g/h/i-line exposure
Hazards

Nfpa704
HealthNum2
FlamNum2
 
Whmis picts
Flamtrue
Excltrue

Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2
,
Hazcat
HazClassFlammable liquids
HazCat3
,
Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
Comments
Status

Status
titleStocked
  




Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


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