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titleOverview

The Chiaro system utilizes a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher), which provides an advanced method of cleaning carbon contamination for electron microscopy samples.



Page properties
idequipment-properties


LMACS NameIBSS Contamination Control System
Confluence Labelibss-contamination-control-system
Process Area

Equipment process area
EquipmentAreaCharacterization

Model Chiaro Chiaro system with GV10x DownStream Asher
VendorIBSS Group (EIN#260267616)
Team

Emmett Yu Xuehai Tan Devin Fortier Peng LiDevin Fortier  Michael Hume 




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groupnf-staff


Serial NumberS5150217 C2160026
UofA Asset Tag Number736061
Service Contract

Status
colourGreen
titleYes
   




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Contacts


NameCompanyEmailPhone
Technical Contact


Sales ContactInsert the sales contact




System Features

Sample ApplicationRemove organic contamination for SEM and TEM sample preparation
Gas SpeciesN2/O2N2/H2
High Plasma Power49-99 W
Low Plasma Power1-49 W
Decontamination ratenear 1nm/min carbon at 20Wnear 0.1 nm/min carbon at 20 W


Key Documents

SOP

Google Drive Live Link
urlhttps://drive.google.com/file/d/1OhJUQtaiblv6SzGMql1IJfrI4g6KweW5/view?usp=drivesdk

Hazard Assessment

Google Drive Live Link
urlhttps://drive.google.com/file/d/19C0jfrw7BTitI3FeWK1HjFY9oh8nFzd-/view?usp=drivesdk



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Staff Documents

Operator Manual
Service Manual
Installation Guide
System Drawings

Drive Folder

Embedded Google Drive Folder
limit100
sortname
urlhttps://drive.google.com/drive/folders/17OYq0gS_e-tKypEYvIPeUEzwlcuCVG0Q


Related Documents

Content by Label
cqllabel = "ibss-contamination-control-system"