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Ultra-high-resolution, low-voltage (0.1–30 kV), electron-beam lithography tool, capable of writing structures over a 150 mm diameter wafer. Demonstrated proficiency on an SEM is a prerequisite to receiving training on this tool. |
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Business hours bookings must fall within one of these 3 time windows:
Any violation of this will result in booking cancellation. |
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Contacts
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System Features
| Acceleration Voltage | 0.1 kV to 30 kV |
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| Minimum Resolution | Field emission source with ultimate resolution <10 nm |
| Sample Sizes | pieces to 100 mm |
| Field Stitching | Better than 25 nm |
| Overlay Alignment | Better than 40 nm |
| Stage | Fixed Beam Moving Stage (FBMS) capable |
| Beam | Beam tracking capable for increased e-beam stability |
| Environmental | Environmental controlled enclosure |
Documents
| Operating Procedures & Hazard Assessments |
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Staff Documents
Drive Folder
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Related Documents
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