Ultra-high-resolution, low-voltage (0.1–30 kV), electron-beam lithography tool, capable of writing structures over a 150 mm diameter wafer. Demonstrated proficiency on an SEM is a prerequisite to receiving training on this tool.
Business hours bookings must fall within one of these 3 time windows:
Any violation of this will result in booking cancellation.
|Acceleration Voltage||0.1 kV to 30 kV|
|Minimum Resolution||Field emission source with ultimate resolution <10 nm|
|Sample Sizes||pieces to 100 mm|
|Field Stitching||Better than 25 nm|
|Overlay Alignment||Better than 40 nm|
|Stage||Fixed Beam Moving Stage (FBMS) capable|
|Beam||Beam tracking capable for increased e-beam stability|
|Environmental||Environmental controlled enclosure|
|Operating Procedures & Hazard Assessments|
|Content by Label|