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DateTimeTitleAreaVendor

 

12:00 pm, MDTIncrease throughput and quality of your semiconductor deep cross sections, Ga+ free TEM samples, and delayeringCharacterization, FIB/SEMTescan

 

1:30 pm, CETDigital EPDIC luncheonCharacterizationBruker

 

8:00 – 8:45 am MDTFocused Ion Beams for advanced nanofabricationFabricationRaith

 

9:00 am, MDTCompositional and Structural Analysis of Thin Films in the SEM using EDSCharacterization, EDXOxford

 

12:00 pm, MDTSpectroscopic Ellipsometry for Organic Electronic ApplicationsCharacterization, SpectroscopyHoriba

 

 

MSC-SMC Annual MeetingCharacterization, EMMSC, Various Vendors

 

9:00 am, MDTLow Energy X-Ray Microanalysis: Ultim ExtremeCharacterization, EDXOxford

 

8:00 – 8:45 am MDTFIB SEM applications beyond gallium and benefits of AuSi ion beamsFabricationRaith

 

2:00 – 2:45 pm MDTMaskless Aligner Technology for Thick Resist ApplicationsFabricationHeidelberg

 

8:00 – 8:45 am MDTAdvanced FIB patterning and large area applicationsFabricationRaith

 

1:00 pm, EDTRecent Advances in X-ray Photoelectron Spectroscopy (XPS) and Near-Ambient Pressure MethodsCharacterization, XPSPHI

 

2:00 – 2:45 pm MDTGrayscale Laser Lithography with Heidelberg Instruments DWL SeriesFabricationHeidelberg

 

 

Rigaku Virtual Analytical X-ray ConventionCharacterization, XRDRigaku

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