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This section describes the Tystar LPCVD tube stack. The stack consists of 6 tubes for Nitride, Poly Si, Doped Poly Si, Doped Anneal, General Anneal and Oxidation. Each tube is considered a separate tool in LMACS. |
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Contacts
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LPCVD Tube Configuration & Chemistry
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The LPCVD Stack contains 3 furnaces, each configured for unique processing, with different chemistry. Details of the configuration are listed below. |
| Tube Number | Process Name | Chemistry |
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| 1 | EMPTY | N/A |
| 2 | Nitride | DCS, NH3 |
| 3 | Poly Si | (100%) SiH4 |
| 4 | Boron Doped Poly Si | (100%) SiH4, (3%) BCl3 |
| 5 | Doped Anneal | N2 |
| 6 | General Anneal | N2 |
| 7 | Oxidation | Oxygen, H2O |
| 8 | EMPTY | N/A |
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