Non-contact exposure, outstanding ease of use, and high speed make the Maskless Aligner MLA150 the ideal tool in rapid prototyping environments, for low- to mid-volume production, and in Research & Development. Heidelberg's once revolutionary, now state-of-the-art maskless technology has become firmly established since their Maskless Aligner series was first introduced in 2015. The MLA150 now presents the modern-day alternative to the traditional Mask Aligner.
Maskless photolithography eliminates the need for a photomask: the system exposes the pattern directly onto the resist-covered surface. Should design modifications be required, these can be quickly implemented by changing the CAD layout, resulting in much-reduced cycle times. You will also benefit from a fast, automated front- and backside alignment procedure as well as the outstanding patterning speed: exposing an area of 100 × 100 mm² can take less than 10 minutes (resist and minimum feature size dependent). The application areas of the MLA150 include life sciences, MEMS, micro-optics, semiconductors, sensors, actuators, MOEMS, material research, nano-tubes, and 2D materials (e.g. graphene and h-BN).