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ProductMicroposit MF-319 Developer
ManufacturerRohm And Haas Electronic Materials LLC
Composition95.0–99.0% water, 1.0–5.0% tetramethylammonium hydroxide, <1.0% polyalkylene glycol; liquid
Synonyms319, MF-319
Typical UsesDeveloper for photolithography
Hazards

Nfpa704
HealthNum3

Whmis picts
Healthtrue
Corrtrue

Hazcat
HazClassCorrosive to metals
HazCat1
Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat1
 (oral), 
Hazcat
HazClassSpecific target organ toxicity – repeated exposure
HazCat1
(dermal), 
Hazcat
HazClassSkin corrosion/irritation
HazCat2
Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2

StorageDeveloper cabinet in wet aisle 1; underneath litho wet decks
DisposalPour into wet deck (Litho Wet Deck 1/2, Wet Deck 1A/1B/2A) and rinse copiously with DI water.
CommentsStandard developer for LOR 5B in lift-off bilayer process.  Contains 2.45% TMAH; normality of 0.237 N.
Status

Status
titleStocked
  




Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


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