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ProductAZ 300 MIF Developer
ManufacturerEMD Performance Materials Corp
Composition>95% water, <3% tetramethylammonium hydroxide; liquid
Synonyms
Typical UsesDeveloper for photolithography
Hazards

Nfpa704
HealthNum2
Whmis picts
Corrtrue
Excltrue

Hazcat
HazClassCorrosive to metals
HazCat1
, 
Hazcat
HazClassSkin corrosion/irritation
HazCat2
, 
Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2
,
Hazcat
HazClassAcute toxicity
HazCat4
  (oral), 
Hazcat
HazClassFlammable gases
SubCatA
HazCat4

StorageCabinet 13 (bases cabinet in Wet Aisle 1); underneath litho wet decks
DisposalPour into wet deck (Litho Wet Deck 1/2, Wet Deck 1A/1B/2A) and rinse copiously with DI water.
CommentsLogin to tool Litho Wet Deck #1 - TMAH or Litho Wet Deck #2 - TMAH when using.  Wear PPE when handling:  chemical-resistant gloves, acid apron, face shield.
Status



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groupnf-staff


Import Request

Ali Banss, Sheba Microsystems, . [Request]






Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


Embedded Google Drive File
urlhttps://drive.google.com/file/d/1J1YLdiO8Fl-b90aBD_vhr7uiaosDpeV2/view?usp=drivesdk
fullwidthtrue
height600