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changes.mady.by.user Adam Pettigrew

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changes.mady.by.user Davor Karacic

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titleOverview

Used for photoresist developing. With additional training, development of HSQ resist using 25% TMAH on Litho Wet Deck #1. Due to the additional hazard of using this developer, a Buddy is required for after-hours access.



Page properties
idequipment-properties


LMACS NameLitho Wet Deck #1, Litho Wet Deck #1 - TMAH
Confluence Labellitho-wet-deck-1
Process Area

Equipment process area
EquipmentAreaLithography

Model
Vendor
Team

Stephanie Bozic Gustavo de Oliveira Luiz  Aaron HryciwMichael Hume Adam Pettigrew




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Serial Number
UofA Asset Tag Number
Service Contract

Status
colourRed
titleNO




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Contacts


NameCompanyEmailPhone
Technical Contact


Sales ContactInsert the sales contact




System Features

Wafer HandlingPieces100 mm150 mm
UtilitiesN2DI H2O
Chemicals AllowedIPA/AcetoneDevelopersTMAH


Key Documents

Standard Operating Procedures




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Staff Documents

Dump Rinse Controller

Google Drive Live Link
urlhttps://drive.google.com/file/d/1ccWlvTAgmrwbMrU0PD4hGzudWCp_GWrL/view?usp=drivesdk

Operator Manual
Installation Guide
System Drawings

Drive Folder

Embedded Google Drive Folder
limit100
sortname
urlhttps://drive.google.com/drive/folders/1LPV3smU_830Sm9LaNHEjZJiajJSGZEJi


Related Documents

Content by Label
cqllabel in ("equipment","lithography","litho","wet-deck")