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ProductAZ 1529 photoresist
Manufacturer

EMD Performance Materials Corp.

Composition65–70% 1-Methoxymethoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic diazonaphthoquinonesulfonic ester, 0 - 0.3% 2-Methoxymethoxy-1-propanol acetate, 25–30% Cresol cresol novolak resin; liquid
Synonyms
Typical UsesPositive-tone photoresist for broadband and g/h/i-line exposure
Hazards

Nfpa704
HealthNum2
FlamNum2
 
Whmis picts
Flamtrue
Excltrue

Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2
,
Hazcat
HazClassFlammable liquids
HazCat3
,
Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge outside W1-040
DisposalSolid: Organic waste / organic sharps waste containers in primary or secondary litho areas.  Liquid: solvent waste bottles in litho wet decks or wet decks 1A/1B/2A.
CommentsStandard recipe yields ~3.4 µm resist thickness.
Status

Status
titleStocked
  




Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


Embedded Google Drive File
urlhttps://drive.google.com/a/ualberta.ca/file/d/1Aztcd7Mq5fu8VGjq-yowRuL5hKwdGBbt/view?usp=drivesdk
height600

Additional information