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ProductAZ 1512 1529 Photoresist
Manufacturer

EMD Performance Materials Corp.

Composition65–70% 1-Methoxy-2-propanol acetate, 5–10% Diazonaphthoquinonesulfonic ester, <00.3% 2-Methoxy-1-propanol acetate, 25–30% Cresol novolak resin
Synonyms
Typical UsesPositive-tone photoresist for broadband and g/h/i-line exposure
Hazards

Nfpa704
HealthNum2
FlamNum2
 
Whmis picts
Flamtrue
Excltrue

Hazcat
HazClassSerious eye damage/eye irritation
SubCatA
HazCat2

Hazcat
HazClassFlammable liquids
HazCat3

Hazcat
HazClassSpecific target organ toxicity – single exposure
HazCat3

StorageWorking volumes in amber bottles, stored in primary litho area; stock bottles in resist fridge.
DisposalLiquid:  solvent waste bottles in wet decks; solid: organics waste pail under Aisle 1 Fumehood
CommentsStandard recipe yields ~3.4 µm resist thickness.
Status

Status
titleStocked
  




Warning
titleCheck First

Please contact a nanoFAB staff member for uses not listed above.


Embedded Google Drive File
urlhttps://drive.google.com/a/ualberta.ca/file/d/1Aztcd7Mq5fu8VGjq-yowRuL5hKwdGBbt/view?usp=drivesdk
height600