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Overview
A planar magnetron sputtering syst= em with three guns, for deposition of metals only. The gun/substrate config= uration is designed for sequential sputtering.
Sputter Gun Type | 3" guns; t= wo standard guns, one gun for magnetic materials; sputter-up configuration<= /span> |
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Gas Species | Ar |
Power Supply | MDX 500 |
Substrate Handling | Small pieces on carrier wafers up to several 200= mm diameter full wafers |
Features | Substrate rotation |